ALD equipment manufacturer
The ALD process is vacuum deposition process of oxides, nitrides and metals on conformal (3D) surfaces, in which selected number of layers are generated one by one, e.g. 1Å to 100nm. In the ALD deposition process, the reactive gasses go into every pore of the material, thus the method is used to cover very high aspect ratio vias (holes) in semiconductor industry, protect inner walls of micro-fluidic channels and ink-jets, coat membranes and fibers (e.g. fabric-fibers) without blocking them.